Anti-reflective thin film coating is required in the
manufacture of solar cells to aide in the entrapment of light into the
cell. It is typically applied by the atmospheric pressure chemical
deposition process (APCVD) using titanium oxide (TiO2) or plasma
enhanced chemical vapor deposition (PECVD) using silicon nitride. BTU offers it’s TCD
furnace for the application of anti-reflective coating which is the
APCVD process. This is an in-line solution.